CPC C23C 14/042 (2013.01) [B05C 21/005 (2013.01); B21B 1/227 (2013.01); B21H 7/00 (2013.01); B21H 8/005 (2013.01); B23P 15/00 (2013.01); C23C 14/24 (2013.01); G03F 7/0015 (2013.01); Y10T 29/49826 (2015.01); Y10T 29/49863 (2015.01)] | 5 Claims |
1. A method of manufacturing a metal mask, comprising:
calendering a metal material, so as to form a metal mask substrate, wherein the metal mask substrate comprises a surface and a plurality of grooves formed in the surface, and the grooves all extend in a direction, wherein the surface has at least one sampling region, and at least two grooves are distributed in the at least one sampling region, wherein an average area ratio of an area of the grooves within the sampling region to an area of the sampling region ranges between 45% and 68%; and
performing a photolithography to the metal mask substrate.
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