US 11,682,574 B2
Electrostatic chuck design with improved chucking and arcing performance
Abdul Aziz Khaja, San Jose, CA (US); Venkata Sharat Chandra Parimi, Sunnyvale, CA (US); Sarah Michelle Bobek, Santa Clara, CA (US); Prashant Kumar Kulshreshtha, San Jose, CA (US); and Vinay K. Prabhakar, Cupertino, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 7, 2019, as Appl. No. 16/677,491.
Claims priority of provisional application 62/774,644, filed on Dec. 3, 2018.
Prior Publication US 2020/0176296 A1, Jun. 4, 2020
Int. Cl. H01L 21/683 (2006.01); H01J 37/32 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/32642 (2013.01); H01J 37/32724 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate support, comprising:
a body having a center;
a lower ledge extending from the center to an annular first lip;
an annular second lip radially outward of the first lip, and separated from the first lip by a channel;
a first support surface on the first lip and a second support surface on the second lip, each of the first and second support surfaces configured to at least partially support a substrate;
a first angled wall that extends upward and radially outward from the second support surface;
a first upper surface disposed above the second support surface;
a second angled wall that extends upward and radially outward from the first upper surface, the first upper surface extending between the first angled wall and the second angled wall; and
a second upper surface extending from the second angled wall, the second upper surface being disposed above the first upper surface.