CPC G06F 30/398 (2020.01) [G06F 30/392 (2020.01); H01L 24/14 (2013.01); G06F 2111/10 (2020.01); G06F 2113/18 (2020.01)] | 20 Claims |
1. A method, comprising:
determining, for first layout data of features to be formed on a surface of a wafer, an initial pattern density value for each of a plurality of grid regions of the first layout data under a first grid level;
obtaining a planned pattern density value of a first grid region of the plurality of grid regions by adjusting an initial pattern density value of the first grid region based on an initial pattern density value of a second grid region of the plurality of grid regions under the first grid level; and
determining a second layout data of the first grid region based on the planned pattern density value.
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