	US 11,680,040 B2
	Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern
Hyunmin Park, Daejeon (KR); and Minyoung Lim, Daejeon (KR)
Assigned to LG CHEM, LTD., Seoul (KR)
Appl. No. 16/978,557
Filed by LG CHEM, LTD., Seoul (KR)
PCT Filed Oct. 11, 2019, PCT No. PCT/KR2019/013364 § 371(c)(1), (2) Date Sep. 4, 2020, PCT Pub. No. WO2020/076122, PCT Pub. Date Apr. 16, 2020.
Claims priority of application No. 10-2018-0120977 (KR), filed on Oct. 11, 2018.
Prior Publication US 2021/0017127 A1, Jan. 21, 2021
Int. Cl. C07C 309/12 (2006.01); C07C 323/61 (2006.01); C07C 323/62 (2006.01); C07C 381/12 (2006.01); G03F 7/004 (2006.01); G03F 7/032 (2006.01); G03F 1/42 (2012.01); C08F 32/08 (2006.01)

CPC C07C 309/12 (2013.01) [C07C 323/62 (2013.01); C07C 381/12 (2013.01); C08F 32/08 (2013.01); G03F 1/42 (2013.01); G03F 7/0045 (2013.01); G03F 7/032 (2013.01); C07C 2602/42 (2017.05); C07C 2603/74 (2017.05)]

14 Claims

1. A compound represented by Chemical Formula 1:

wherein, in the Chemical Formula 1,

p is an integer of 2 to 4;

X is S, a substituted or unsubstituted aryl group, a substituted or unsubstituted heteroaryl group or a substituted or unsubstituted alkyl group, provided that

when p is an integer of 3 or 4, X is not S;

L₁is the same as or different from each other and each independently is a direct bond, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, or a substituted or unsubstituted heteroarylene group;

Rb is the same as or different from each other and each independently is a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heteroaryl group;

Q⁺ is the same as or different from each other and each independently is an onium cation;

Y⁻ is the same as or different from each other and each independently is an acid anion; and

m and n are each an integer of 1 to 10.