US 11,674,448 B2
Seal system having silicon layer and barrier layer
Raymond Surace, Newington, CT (US); Brian T. Hazel, Avon, CT (US); Robert A. White, III, Meriden, CT (US); and Zhongfen Ding, South Windsor, CT (US)
Assigned to RAYTHEON TECHNOLOGIES CORPORATION, Farmington, CT (US)
Filed by RAYTHEON TECHNOLOGIES CORPORATION, Farmington, CT (US)
Filed on Jul. 16, 2021, as Appl. No. 17/377,591.
Prior Publication US 2023/0019497 A1, Jan. 19, 2023
Int. Cl. F01D 11/00 (2006.01); F02C 7/28 (2006.01); F01D 11/08 (2006.01); F02C 3/04 (2006.01); F16J 15/16 (2006.01)
CPC F02C 7/28 (2013.01) [F01D 11/001 (2013.01); F01D 11/005 (2013.01); F01D 11/08 (2013.01); F02C 3/04 (2013.01); F16J 15/16 (2013.01); F05D 2220/32 (2013.01); F05D 2240/35 (2013.01); F05D 2240/55 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A seal system comprising:
a ceramic component having a first surface region defining a first surface roughness;
a metallic component situated adjacent the first surface region;
a silicon-containing layer on the first surface region of the ceramic component, the silicon-containing layer having a contact surface defining a second surface roughness that is less than the first surface roughness; and
a barrier layer on the metallic component and in contact with the silicon-containing layer, the barrier layer including an oxide and being a monolayer, the silicon-containing layer having a first thickness, the barrier layer having a second thickness, the first thickness being greater than the second thickness, and the barrier layer limiting interaction between silicon of the silicon-containing layer and elements of the metallic component.