CPC C09K 11/025 (2013.01) [H01L 31/035218 (2013.01); H01L 31/18 (2013.01); B82Y 15/00 (2013.01); B82Y 20/00 (2013.01); B82Y 30/00 (2013.01)] | 7 Claims |
1. A method of treating a workpiece, comprising the steps of:
providing a workpiece comprising a colloidal quantum dot (CQD) film deposited on a substrate, the substrate comprising a device structure, an electronic circuit, a host material or other dot film, the CQD film deposited leaving a film surface exposed to chemical treatments;
providing a first volume of diluted H2O2;
adding de-ionized water to provide a second volume;
adding the second volume to isopropyl alcohol forming a treatment solution;
immersing the workpiece into the treatment solution; and
removing the workpiece from the treatment solution.
|