US 11,673,170 B2
Method for cleaning a vacuum system used in the manufacture of OLED devices, method for vacuum deposition on a substrate to manufacture OLED devices, and apparatus for vacuum deposition on a substrate to manufacture OLED devices
Jose Manuel Dieguez-Campo, Hanau (DE); Stefan Keller, Mainaschaff (DE); Jae Won Lee, Aschaffenburg (DE); Takashi Anjiki, Kyoto (JP); and Dieter Haas, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Appl. No. 16/318,052
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Apr. 28, 2017, PCT No. PCT/EP2017/060239
§ 371(c)(1), (2) Date Jan. 15, 2019,
PCT Pub. No. WO2018/197008, PCT Pub. Date Nov. 1, 2018.
Prior Publication US 2021/0308725 A1, Oct. 7, 2021
Int. Cl. B08B 7/04 (2006.01); B08B 3/08 (2006.01); B08B 7/00 (2006.01); B08B 9/08 (2006.01); C23C 14/12 (2006.01); C23C 14/24 (2006.01); C23C 14/56 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01)
CPC B08B 7/04 (2013.01) [B08B 3/08 (2013.01); B08B 7/0035 (2013.01); B08B 9/08 (2013.01); C23C 14/12 (2013.01); C23C 14/24 (2013.01); C23C 14/566 (2013.01); H01L 51/001 (2013.01); H01L 51/0011 (2013.01); H01L 51/56 (2013.01); B08B 2209/08 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for cleaning a vacuum system used in the manufacture of OLEO devices, comprising:
performing pre-cleaning for cleaning at least a portion of a vacuum system, wherein the pre-cleaning includes a wet chemical cleaning process; and
performing plasma cleaning using a remote plasma source, the plasma cleaning performed after the pre-cleaning.