| CPC H01L 21/6708 (2013.01) [H01L 21/67167 (2013.01); H01L 21/67017 (2013.01); H01L 21/67051 (2013.01); H01L 21/67155 (2013.01); H01L 21/67248 (2013.01)] | 12 Claims |
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1. A substrate processing apparatus comprising:
a substrate holding unit which holds a substrate horizontally;
a processing liquid supplying unit which has a processing liquid nozzle discharging a processing liquid and supplies the processing liquid to an upper surface of the substrate; and
a moving unit which moves the processing liquid supplying unit between a process position at which the processing liquid nozzle faces the upper surface of the substrate and a retreat position at which the processing liquid nozzle retreats from positions at which the processing liquid nozzle faces the upper surface of the substrate,
wherein the processing liquid supplying unit includes
a first flow path which is formed in the processing liquid nozzle and extends in parallel with the upper surface of the substrate, the first flow path having one end part that faces a central region of the substrate and an other end part that faces a peripheral region of the substrate, in a state where the processing liquid supplying unit is positioned at the process position,
a second flow path which is located above the first flow path, extends so as to overlap the first flow path in a plan view, extends in parallel with the first flow path, and supplies the processing liquid to the one end part of the first flow path,
a turning back flow path which connects the one end part of the first flow path and the second flow path, and
a plurality of discharge ports which are formed in the processing liquid nozzle, are arranged along an extending direction in which the first flow path extends, and discharge the processing liquid in the first flow path to the upper surface of the substrate,
wherein the one end part of the first flow path is provided at an end part of the processing liquid nozzle in the extending direction,
the plurality of discharge ports face the upper surface of the substrate,
the first flow path is closed at the other end part of the first flow path,
the processing liquid supplying unit further includes a flow path forming pipe in which the second flow path is formed,
the flow path forming pipe is fixed with the processing liquid nozzle,
the processing liquid nozzle extends in parallel with the upper surface of the substrate,
the processing liquid supplying unit further includes a suction unit which sucks the processing liquid in the first flow path,
the suction unit includes a suction pipe which is branched from and connected to the flow path forming pipe at an intersecting portion at which the second flow path and the turning back flow path intersect and in which a suction flow path is formed,
the suction flow path is directly connected to the intersecting portion, and
the suction unit further includes a suction device which sucks an inside of the first flow path via the suction flow path.
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