US 11,670,522 B2
Processing liquid generator and substrate processing apparatus using the same
Konosuke Hayashi, Yokohama (JP); and Kunihiro Miyazaki, Yokohama (JP)
Assigned to SHIBAURA MECHATRONICS CORPORATION, Yokohama (JP)
Filed by SHIBAURA MECHATRONICS CORPORATION, Yokohama (JP)
Filed on Jul. 27, 2017, as Appl. No. 15/661,480.
Claims priority of application No. JP2016-150832 (JP), filed on Jul. 29, 2016; and application No. JP2017-124215 (JP), filed on Jun. 26, 2017.
Prior Publication US 2018/0033651 A1, Feb. 1, 2018
Int. Cl. H01L 21/67 (2006.01)
CPC H01L 21/67075 (2013.01) [H01L 21/6708 (2013.01); H01L 21/67017 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A processing liquid generator that generates processing liquid having undergone concentration adjustment based on a concentration measured with a concentration meter, the generator comprising:
a processing liquid adjuster configured to adjust the concentration of the processing liquid;
a first processing liquid path through which the processing liquid flows to the processing liquid adjuster;
a second processing liquid path through which the processing liquid flows to the processing liquid adjuster;
a first concentration meter that is provided in the first processing liquid path and is configured to measure the concentration of the processing liquid flowing through the first processing liquid path, the measured concentration being a concentration of a component involved in the concentration adjustment in the processing liquid adjuster;
a second concentration meter that is provided in the second processing liquid path and is configured to measure the concentration of the processing liquid flowing through the second processing liquid path, the measured concentration being a concentration of the component that is involved in the concentration adjustment in the processing liquid adjuster and should be measured with the first concentration meter in terms of concentration;
a first valve mechanism that is provided in the first processing liquid path and is switched between an open state in which flow of the processing liquid is allowed in the first processing liquid path and a closed state in which the flow of the processing liquid is stopped in the first processing liquid path; and
a second valve mechanism that is provided in the second processing liquid path and is switched between an open state in which flow of the processing liquid is allowed in the second processing liquid path and a closed state in which the flow of the processing liquid is stopped in the second processing liquid path,
wherein the first processing liquid path includes a first part which is provided with the first concentration meter and is not included in the second processing liquid path, and the second processing liquid path includes a second part which is provided with the second concentration meter and is not included in the first processing liquid path, and
wherein the first valve mechanism includes two valves which are provided in the first part so as to sandwich the first concentration meter at an upstream side and at a downstream side in a flow direction of the processing liquid, and the second valve mechanism includes two valves which are provided in the second part so as to sandwich the second concentration meter at an upstream side and at a downstream side in a flow direction of the processing liquid, and
the processing liquid generator further comprising:
a control unit configured to control the two valves of the first valve mechanism so as to close the two valves of the first valve mechanism to stop the flow of the processing liquid in the first processing liquid path when determining that the first concentration meter is not normally operating, and to control two valves of the second valve mechanism so as to close the two valves of the second valve mechanism to stop the flow of the processing liquid in the second processing liquid path when determining that second concentration meter is not normally operating.