US 11,967,517 B2
Electrostatic chuck with ceramic monolithic body
Feng Wang, Sunnyvale, CA (US); Keith Gaff, Fremont, CA (US); Christopher Kimball, San Jose, CA (US); and Darrell Ehrlich, San Jose, CA (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Appl. No. 17/429,434
Filed by LAM RESEARCH CORPORATION, Fremont, CA (US)
PCT Filed Jan. 27, 2020, PCT No. PCT/US2020/015148
§ 371(c)(1), (2) Date Aug. 9, 2021,
PCT Pub. No. WO2020/167451, PCT Pub. Date Aug. 20, 2020.
Claims priority of provisional application 62/804,465, filed on Feb. 12, 2019.
Prior Publication US 2022/0148903 A1, May 12, 2022
Int. Cl. H01T 23/00 (2006.01); C04B 37/00 (2006.01); C04B 41/00 (2006.01); C04B 41/45 (2006.01); H01J 37/32 (2006.01); H01L 21/683 (2006.01)
CPC H01L 21/6833 (2013.01) [C04B 37/001 (2013.01); C04B 41/009 (2013.01); C04B 41/4531 (2013.01); H01J 37/32715 (2013.01); H01J 37/32091 (2013.01); H01J 2237/2007 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An electrostatic chuck for a substrate processing system, comprising:
a monolithic body made of ceramic:
a plurality of first electrodes that are arranged in the monolithic body adjacent to a top surface of the monolithic body and that are configured to selectively receive a chucking signal;
a gas channel formed in the monolithic body and configured to supply back side gas to the top surface; and
a plurality of coolant channels formed in the monolithic body and configured to receive fluid to control a temperature of the monolithic body.