CPC H01L 21/6833 (2013.01) [C04B 37/001 (2013.01); C04B 41/009 (2013.01); C04B 41/4531 (2013.01); H01J 37/32715 (2013.01); H01J 37/32091 (2013.01); H01J 2237/2007 (2013.01)] | 18 Claims |
1. An electrostatic chuck for a substrate processing system, comprising:
a monolithic body made of ceramic:
a plurality of first electrodes that are arranged in the monolithic body adjacent to a top surface of the monolithic body and that are configured to selectively receive a chucking signal;
a gas channel formed in the monolithic body and configured to supply back side gas to the top surface; and
a plurality of coolant channels formed in the monolithic body and configured to receive fluid to control a temperature of the monolithic body.
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