| CPC H01L 21/67253 (2013.01) [G05B 19/41875 (2013.01); H01L 21/67742 (2013.01); H01L 21/68707 (2013.01); G05B 2219/31437 (2013.01); G05B 2219/32368 (2013.01)] | 15 Claims |
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1. A system for controlling a process, comprising:
a semiconductor process facility includes a process chamber configured to perform processing on a substrate and a transfer robot configured to transport the substrate; and
an apparatus for controlling a process configured to control operations of the process chamber and the transfer robot,
the apparatus comprising:
a processor, and
a memory for storing a plurality of instructions executed by the processor,
wherein the plurality of instructions comprise:
an instruction for determining deviation tendency of a seating point of the substrate with respect to a seating center point of a substrate support based on seating point data created by accumulating the seating points of the substrate seated on the substrate support;
an instruction for determining an alarm level according to the determined deviation tendency; and
an instruction for performing post-processing according to the determined alarm level, the instruction for performing post-processing comprising an instruction for controlling a transfer robot that moves the substrate, the instruction for controlling the transfer robot comprising an instruction for determining a direction and a distance of a seating point deviation from the seating center point based on a seating point group formed by a plurality of prior seating points.
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