US 11,967,492 B2
Thin film manufacturing apparatus
Byoung Il Lee, Osan-Si (KR); Chang Kyo Kim, Hwaseong-Si (KR); Chang Min Kwon, Osan-Si (KR); and Seung Won Yu, Osan-Si (KR)
Assigned to AP SYSTEMS INC., (KR)
Filed by AP SYSTEMS INC., Hwaseong-Si (KR)
Filed on Oct. 6, 2021, as Appl. No. 17/495,796.
Claims priority of application No. 10-2020-0136090 (KR), filed on Oct. 20, 2020.
Prior Publication US 2022/0122824 A1, Apr. 21, 2022
Int. Cl. H01J 37/32 (2006.01); C23C 16/509 (2006.01)
CPC H01J 37/32899 (2013.01) [C23C 16/5096 (2013.01); H01J 37/3244 (2013.01); H01J 37/32568 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A thin film manufacturing apparatus comprising:
a chamber having an inner process space of a substrate;
a substrate support unit connected to the chamber to support the substrate in the chamber;
a heat source unit connected to the chamber and disposed opposite to the substrate support unit;
a plasma generation unit connected to one side of the chamber to supply radicals between the substrate support unit and the heat source unit; and
a baffle connected to the chamber and comprising a movement passage of the radicals therein and a plurality of first exhaust holes communicating with the movement passage, which are formed in a top surface thereof,
wherein the process space is formed to have a height less than each of a width and a thickness thereof,
the chamber comprises an injection hole formed at one side of the chamber in the thickness direction to inject the radicals from the plasma generation unit into the process space,
the baffle is disposed at the other side of the chamber in the thickness direction to extend in the width direction,
the plurality of first exhaust holes are spaced apart from each other, and
a portion of the plurality of first exhaust holes are formed at different heights in the height direction.