	US 11,966,169 B2
	Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof
Mohamed Swillam, Wilton, CT (US); Tamer Mohamed Tawfik Ahmed Elazhary, New Canaan, CT (US); Stephen Roux, New Fairfield, CT (US); Yuxiang Lin, Wilton, CT (US); and Justin Lloyd Kreuzer, Trumbull, CT (US)
Assigned to ASML Holding N.V., Veldhoven (NL)
Filed by ASML Holding N.V., Veldhoven (NL)
Filed on Sep. 23, 2020, as Appl. No. 17/029,845.
Claims priority of provisional application 63/079,211, filed on Sep. 16, 2020.
Claims priority of provisional application 63/010,367, filed on Apr. 15, 2020.
Claims priority of provisional application 62/907,024, filed on Sep. 27, 2019.
Prior Publication US 2021/0095957 A1, Apr. 1, 2021
Int. Cl. G03F 7/00 (2006.01); G01B 11/14 (2006.01); G01B 11/27 (2006.01); G02B 6/12 (2006.01); G02B 6/293 (2006.01); H01L 21/67 (2006.01)

CPC G03F 7/70633 (2013.01) [G01B 11/14 (2013.01); G01B 11/272 (2013.01); G02B 6/12007 (2013.01); G03F 7/70575 (2013.01); G03F 7/70616 (2013.01); G03F 7/7085 (2013.01); G01B 2210/56 (2013.01); G02B 6/29301 (2013.01); G02B 6/29395 (2013.01); G03F 7/70608 (2013.01); H01L 21/67259 (2013.01)]

24 Claims

1. A system comprising:

a radiation source;

first and second phased arrays comprising optical elements configured to radiate radiation waves;

a plurality of ports;

waveguides configured to guide radiation from a port of the plurality of ports to the optical elements; and

phase modulators configured to adjust phases of the radiation waves;

wherein one or both of the first and second phased arrays are respectively configured to form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source; and

a detector configured to receive radiation diffracted by the target structure and to generate a measurement signal based on the received radiation, wherein the measurement signal is indicative of an alignment characteristic or an overlay characteristic of the target structure.