CPC G03F 7/0397 (2013.01) [G03F 7/0042 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); G03F 7/32 (2013.01); G03F 7/36 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01)] | 20 Claims |
1. A photoresist composition, comprising:
a photoactive compound; and
a polymer,
wherein the polymer has a polymer backbone comprising one or more groups selected from:
wherein the polymer backbone includes at least one group selected from B, C-1, or C-2,
ALG is an acid labile group, and
X is a linking group.
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