CPC B24B 37/005 (2013.01) [B24B 37/20 (2013.01)] | 11 Claims |
1. A conditioner of a chemical mechanical polishing (CMP) apparatus, the conditioner comprising:
a disk to polish a polishing pad of the CMP apparatus;
a driver to rotate the disk;
a lifter to lift the driver;
an arm to rotate the lifter;
a connector to connect the driver to the lifter, the driver and the lifter being connected to vertically non-overlapping portions of the connector such that the driver is tiltable with respect to the lifter; and
an airbag mechanism in the connector, the airbag mechanism including at least two airbags in the connector.
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