CPC B08B 7/0028 (2013.01) [B08B 1/00 (2013.01); B08B 1/001 (2013.01); G03F 1/82 (2013.01); G03F 1/84 (2013.01); G03F 7/0002 (2013.01); G03F 7/70925 (2013.01); G01Q 20/02 (2013.01); G01Q 60/42 (2013.01); G01Q 70/12 (2013.01); G01Q 80/00 (2013.01)] | 15 Claims |
1. A method for removing a debris from a surface of an extreme ultraviolet lithography photomask comprising:
locating the debris on the surface of the extreme ultraviolet lithography photomask;
positioning a tip adjacent to the debris on the surface of the extreme ultraviolet lithography photomask;
catalyzing chemical changes to change a phase of a fluid to a solid using a charged particle beam to surround and entrap the debris at a surface of the tip; and
removing the debris from the surface of the substrate by moving the tip and the entrapped debris away from the surface of the extreme ultraviolet lithography photomask.
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