US 11,964,310 B2
Debris removal from high aspect structures
Tod Evan Robinson, Boynton Beach, FL (US); Bernabe Arruza, Boca Raton, FL (US); Kenneth Gilbert Roessler, Boca Raton, FL (US); David Brinkley, Baltimore, MD (US); and Jeffrey E. LeClaire, Boca Raton, FL (US)
Assigned to Bruker Nano, Inc., Delray Beach, FL (US)
Filed by Bruker Nano, Inc., Delray Beach, FL (US)
Filed on Jan. 6, 2023, as Appl. No. 18/093,968.
Application 16/516,842 is a division of application No. 15/160,263, filed on May 20, 2016, granted, now 10,384,238, issued on Aug. 20, 2019.
Application 14/193,725 is a division of application No. 13/652,114, filed on Oct. 15, 2012, granted, now 8,696,818, issued on Apr. 15, 2014.
Application 18/093,968 is a continuation of application No. 17/348,217, filed on Jun. 15, 2021, granted, now 11,577,286.
Application 17/348,217 is a continuation of application No. 16/516,842, filed on Jul. 19, 2019, granted, now 11,040,379, issued on Jun. 2, 2021.
Application 15/160,263 is a continuation in part of application No. 15/011,411, filed on Jan. 29, 2016, granted, now 10,618,080, issued on Apr. 14, 2020.
Application 15/011,411 is a continuation in part of application No. 14/193,725, filed on Feb. 28, 2014, abandoned.
Application 13/652,114 is a continuation of application No. 11/898,836, filed on Sep. 17, 2007, granted, now 8,287,653, issued on Oct. 16, 2012.
Prior Publication US 2023/0158555 A1, May 25, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. B08B 7/00 (2006.01); B08B 1/00 (2006.01); G03F 1/82 (2012.01); G03F 1/84 (2012.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G01Q 20/02 (2010.01); G01Q 60/42 (2010.01); G01Q 70/12 (2010.01); G01Q 80/00 (2010.01)
CPC B08B 7/0028 (2013.01) [B08B 1/00 (2013.01); B08B 1/001 (2013.01); G03F 1/82 (2013.01); G03F 1/84 (2013.01); G03F 7/0002 (2013.01); G03F 7/70925 (2013.01); G01Q 20/02 (2013.01); G01Q 60/42 (2013.01); G01Q 70/12 (2013.01); G01Q 80/00 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method for removing a debris from a surface of an extreme ultraviolet lithography photomask comprising:
locating the debris on the surface of the extreme ultraviolet lithography photomask;
positioning a tip adjacent to the debris on the surface of the extreme ultraviolet lithography photomask;
catalyzing chemical changes to change a phase of a fluid to a solid using a charged particle beam to surround and entrap the debris at a surface of the tip; and
removing the debris from the surface of the substrate by moving the tip and the entrapped debris away from the surface of the extreme ultraviolet lithography photomask.