US 11,948,780 B2
Automatic electrostatic chuck bias compensation during plasma processing
Linying Cui, Cupertino, CA (US); James Rogers, Los Gatos, CA (US); and Leonid Dorf, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 12, 2021, as Appl. No. 17/319,013.
Prior Publication US 2022/0367158 A1, Nov. 17, 2022
Int. Cl. H01J 37/32 (2006.01); H01L 21/683 (2006.01)
CPC H01J 37/32715 (2013.01) [H01J 37/32146 (2013.01); H01J 37/32568 (2013.01); H01L 21/6831 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/3341 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A plasma processing chamber, comprising: a substrate support assembly, comprising:
a substrate supporting surface;
a first biasing electrode;
a first dielectric layer disposed between the first biasing electrode and the substrate supporting surface;
a waveform generator configured to generate a plurality of pulsed voltage waveforms during a first time period and halt generation of the plurality of pulsed voltage waveforms during a second time period;
a first power delivery line that electrically couples the waveform generator to the first biasing electrode, wherein the first power delivery line comprises a blocking capacitor;
a clamping network coupled to the first power delivery line at a first point between the blocking capacitor and the first biasing electrode, the clamping network comprising:
a direct-current (DC) voltage source coupled between the first point and ground; and
a blocking resistor coupled between the first point and an output of the DC voltage source; and
a controller configured to:
receive, during the first time period and the second time period, information within a first electrical signal obtained via a first signal trace coupled to the first point, wherein the information within the first electrical signal obtained during the first time period comprises a portion of a waveform of the plurality of pulsed voltage waveforms that comprises a first voltage level, and wherein the information within the first electrical signal obtained during the second time period comprises a second voltage level;
compare the first voltage level with the second voltage level; and
control a magnitude of a voltage the DC voltage source supplies to the first point of the first power delivery line based on comparing the first voltage level with the second voltage level.