CPC H01L 22/26 (2013.01) [H01L 21/324 (2013.01); H01L 21/67115 (2013.01); H01L 21/67248 (2013.01); H01L 22/10 (2013.01)] | 20 Claims |
1. A processing chamber, comprising:
a chamber body defining a processing volume;
a quartz window;
a reflector;
a substrate support disposed in the processing volume, wherein the substrate support comprises a substrate supporting surface;
a first heating source operable to direct energy towards the processing volume through the quartz window, wherein the heating source comprises a plurality of heating elements grouped in a plurality of concentric heating zones;
a plurality of pulsed zones comprising one or more heating elements of the plurality of heating elements, wherein the one or more heating elements in at least one zone of the plurality of pulsed zones are configured to be powered in one or more of a different phase or a different amplitude from one or more other heating elements of the plurality of heating elements in a corresponding concentric zone; and
a temperature sensor.
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