US 11,942,351 B2
Electrostatic chucks with coolant gas zones and corresponding groove and monopolar electrostatic clamping electrode patterns
Alexander Matyushkin, San Jose, CA (US); Keith Laurence Comendant, Fremont, CA (US); and John Patrick Holland, San Jose, CA (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Apr. 26, 2023, as Appl. No. 18/139,660.
Application 18/139,660 is a continuation of application No. 16/969,260, granted, now 11,664,262, previously published as PCT/US2018/026299, filed on Apr. 5, 2018.
Prior Publication US 2023/0260816 A1, Aug. 17, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01L 21/683 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/32724 (2013.01); H01L 21/67109 (2013.01); H01L 21/6831 (2013.01); H01J 2237/002 (2013.01); H01J 2237/2007 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A top plate of an electrostatic chuck for a substrate processing system, the top plate bonded to a baseplate of the electrostatic chuck, the top plate comprising:
a body of the top plate having a plurality of distinct coolant gas groove sets, wherein each of the plurality of distinct coolant gas groove sets has one or more coolant gas supply holes; and
a monopolar clamping electrode disposed in the body, wherein the monopolar clamping electrode comprises a groove opening pattern, wherein the groove opening pattern includes a plurality of separate coolant gas groove opening sets, and
wherein each of the plurality of distinct coolant gas groove sets is disposed above a respective one of the plurality of separate coolant gas groove opening sets.