US 11,942,337 B2
Apparatus and method for treating substrate
Eui Sang Lim, Cheonan-si (KR); Young Hun Lee, Cheonan-si (KR); Jinwoo Jung, Seoul (KR); Miso Park, Daejeon (KR); Byongwook Ahn, Seoul (KR); and Yong Hee Lee, Cheonan-si (KR)
Assigned to SEMES CO., LTD., Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Oct. 6, 2020, as Appl. No. 17/063,820.
Claims priority of application No. 10-2019-0124112 (KR), filed on Oct. 7, 2019.
Prior Publication US 2021/0104417 A1, Apr. 8, 2021
Int. Cl. H01L 21/67 (2006.01); H01J 37/32 (2006.01)
CPC H01L 21/67017 (2013.01) [H01J 37/32449 (2013.01); H01J 37/32467 (2013.01); H01J 37/32715 (2013.01); H01J 37/32834 (2013.01); H01J 2237/334 (2013.01)] 8 Claims
OG exemplary drawing
 
1. An apparatus for treating a substrate, the apparatus comprising:
a liquid treating device configured to perform a liquid treatment process for the substrate by supplying a liquid onto the substrate;
a supercritical device configured to perform a drying process to remove the liquid remaining on the substrate; and
a carrying device configured to carry the substrate from the liquid treating device to the supercritical device,
wherein the liquid treating device comprises
a cup having a first treatment space,
a first support unit configured to support the substrate in the first treatment space, and
a nozzle configured to supply a first organic solvent onto the substrate supported by the first support unit,
wherein the supercritical device comprises
a process chamber having a second treatment space inside the process chamber,
a second support unit configured to support the substrate in the second treatment space,
a first fluid supply unit configured to supply, to the second treatment space, a supercritical fluid with a second organic solvent dissolved therein,
a second fluid supply unit configured to supply, to the second treatment space, the supercritical fluid having no organic solvent dissolved therein,
an exhaust unit configured to exhaust the second treatment space, and
a controller configured to control the first fluid supply unit, the second fluid supply unit, and the exhaust unit,
wherein the controller is configured to control the first fluid supply unit and the second fluid supply unit such that the supercritical fluid having no organic solvent dissolved therein is supplied to the second treatment space through the second fluid supply unit, after the supercritical fluid having the second organic solvent dissolved therein is supplied to the second treatment space through the first fluid supply unit, and
wherein the first organic solvent and the second organic solvent are a same organic solvent.