US 11,942,311 B2
Magnet arrangement for a plasma source for performing plasma treatments
Jörg Vetter, Bergisch Gladbach (DE)
Assigned to OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON, Pfäffikon (CH)
Appl. No. 17/416,001
Filed by OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON, Pfäffikon (CH)
PCT Filed Dec. 5, 2019, PCT No. PCT/EP2019/083898
§ 371(c)(1), (2) Date Jun. 18, 2021,
PCT Pub. No. WO2020/126531, PCT Pub. Date Jun. 25, 2020.
Claims priority of provisional application 62/783,387, filed on Dec. 21, 2018.
Claims priority of application No. 236/19 (CH), filed on Feb. 26, 2019.
Prior Publication US 2022/0051882 A1, Feb. 17, 2022
Int. Cl. H01J 37/32 (2006.01); C23C 14/32 (2006.01); H01J 37/34 (2006.01)
CPC H01J 37/32669 (2013.01) [C23C 14/325 (2013.01); H01J 37/32055 (2013.01); H01J 37/32568 (2013.01); H01J 37/32651 (2013.01); H01J 37/34 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A vacuum chamber for performing a plasma treatment comprising a plasma treatment area which is enclosed by chamber walls, and a plasma source comprising:
at least one cathode arranged in the vacuum chamber for cathodic vacuum arc evaporation with an arc anode which is connected to the vacuum chamber;
a shield which can be arranged in front of the cathode;
at least one electrode arranged in the vacuum chamber, wherein the electrode comprises a working surface for collecting the electrons emitted from the cathode;
wherein
the working surface is a two-dimensional surface for collecting the electrons emitted from the cathode, and the two-dimensional surface has a first orthogonal extension and a second orthogonal extension to a surface normal, wherein the first orthogonal extension is perpendicular to the second orthogonal extension and a length ratio of the first orthogonal extension to the second orthogonal extension is between 0.1 and 1,
at least one magnet for generating a magnetic field which acts on the working surface of the electrode is arranged in, on or in and on the vacuum chamber,
the at least one magnet comprises a front-side magnet and a rear-side magnet, wherein the front-side magnet is arranged in an area of the working surface for generating a front-side magnetic field and the rear-side magnet is arranged behind the working surface for generating a rear-side magnetic field.