US 11,940,739 B2
Metrology apparatus
Nitesh Pandey, Eindhoven (NL); Arie Jeffrey Den Boef, Waalre (NL); Duygu Akbulut, Eindhoven (NL); Marinus Johannes Maria Van Dam, Venlo (NL); Hans Butler, Best (NL); Hugo Augustinus Joseph Cramer, Eindhoven (NL); Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot (NL); Ferry Zijp, Nuenen (NL); Jeroen Arnoldus Leonardus Johannes Raaymakers, Veldhoven (NL); and Marinus Petrus Reijnders, Eindhoven (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Dec. 27, 2021, as Appl. No. 17/562,446.
Application 17/562,446 is a continuation of application No. 16/431,833, filed on Jun. 5, 2019, granted, now 11,262,661.
Claims priority of application No. 18177431 (EP), filed on Jun. 13, 2018; application No. 18189926 (EP), filed on Aug. 21, 2018; and application No. 18207812 (EP), filed on Nov. 22, 2018.
Prior Publication US 2022/0121127 A1, Apr. 21, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/20 (2006.01); G01N 21/956 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70625 (2013.01) [G01N 21/956 (2013.01); G03F 7/7015 (2013.01); G03F 7/70633 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A metrology system for analyzing a substrate comprising a plurality of targets and a plurality of fields, the metrology system comprising:
an array comprising a plurality of array elements, wherein each array element of the plurality of array elements is configured to be aligned with a corresponding field of the plurality of fields, and wherein each array element comprises:
an illumination optical system configured to illuminate a corresponding target of the plurality of targets, wherein the corresponding target is disposed at the corresponding field; and
a detection optical system comprising:
a lens configured to direct a portion of illumination scattered from the corresponding target; and
a detection optical sensor configured to receive the directed portion of illumination scattered from the corresponding target and to generate information associated with the illumination scattered from the corresponding target,
wherein the illumination optical system and the detection optical system together have a footprint less than an area of the corresponding field of the substrate.