CPC G03F 1/66 (2013.01) [G03F 1/00 (2013.01); G03F 1/62 (2013.01); G03F 7/20 (2013.01); G03F 7/70008 (2013.01); G03F 7/70983 (2013.01); H01L 21/027 (2013.01)] | 4 Claims |
1. A lithography apparatus comprising:
a light source for emitting light;
a mask mounting zone where a mask for reflecting the light is disposed; and
a mask protective module disposed on the mask to transmit the light from the light source toward the mask, and
a penetration region replacing device,
wherein the penetration region replacing device comprises:
a rod; and
a penetration region mounting unit connected to an end of the rod and configured to turn on the rod as an axis, wherein the penetration region mounting unit comprises a plurality of penetration region modules providing a penetration region of a membrane and turns to provide a new penetration region module not used on the mask protective module,
wherein the mask protective module comprises,
a frame; and
the membrane supported by the frame,
wherein the membrane includes the penetration region for transmitting the light and a peripheral region of which a light transmittance is lower than that of the penetration region.
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