US 11,940,724 B2
Reticle processing system
Sanjay Bhat, Singapore (SG); and Vibhu Jindal, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Dec. 3, 2020, as Appl. No. 17/110,514.
Claims priority of provisional application 62/944,097, filed on Dec. 5, 2019.
Prior Publication US 2021/0173295 A1, Jun. 10, 2021
Int. Cl. G03F 1/20 (2012.01); G03F 7/00 (2006.01); G03F 7/09 (2006.01); G03F 9/00 (2006.01)
CPC G03F 1/20 (2013.01) [G03F 7/09 (2013.01); G03F 7/70283 (2013.01); G03F 7/70716 (2013.01); G03F 7/70741 (2013.01); G03F 9/7096 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A reticle processing system comprising:
a support assembly including a plate coupled to a frame;
a carrier base assembly configured to be positioned on the support assembly, the carrier base assembly comprising a carrier base comprising top surface and a wall extending from the carrier base defining a containment region, the containment region sized and shaped to contain an EUV reticle; and
resting pins extending from a bottom surface of the containment region configured to support the reticle at a distance away from the bottom surface of the carrier base, and the wall defines a height such that the wall has a top surface that extends above a top surface of the reticle when the EUV reticle is placed upon the resting pins.