US 11,939,675 B2
Apparatus and methods for improving thermal chemical vapor deposition (CVD) uniformity
Rui Cheng, Santa Clara, CA (US); Karthik Janakiraman, San Jose, CA (US); and Zubin Huang, Santa Clara, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Appl. No. 16/636,659
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Aug. 10, 2018, PCT No. PCT/US2018/046344
§ 371(c)(1), (2) Date Feb. 5, 2020,
PCT Pub. No. WO2019/033052, PCT Pub. Date Feb. 14, 2019.
Claims priority of provisional application 62/544,507, filed on Aug. 11, 2017.
Prior Publication US 2021/0147981 A1, May 20, 2021
Int. Cl. C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01)
CPC C23C 16/45565 (2013.01) [C23C 16/4585 (2013.01); C23C 16/46 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A face plate, comprising:
a body having a first surface region and a second surface region surrounding the first surface region, the first surface region recessed relative to the second surface region, the first surface region having a first emissivity and the second surface region having a second emissivity, the second emissivity different than the first emissivity;
a first plurality of holes formed through the face plate in the first surface region; and
a second plurality of holes formed through the face plate in the second surface region.