US 11,939,673 B2
Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
John Kevin Shugrue, Phoenix, AZ (US); and Carl Louis White, Gilbert, AZ (US)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Mar. 2, 2021, as Appl. No. 17/189,591.
Application 17/189,591 is a division of application No. 16/242,852, filed on Jan. 8, 2019, granted, now 10,975,470.
Claims priority of provisional application 62/634,793, filed on Feb. 23, 2018.
Prior Publication US 2021/0180189 A1, Jun. 17, 2021
Int. Cl. C23C 16/455 (2006.01); C23C 16/505 (2006.01); G01J 3/443 (2006.01); G01N 21/68 (2006.01); H01J 37/32 (2006.01); G01N 21/15 (2006.01)
CPC C23C 16/45536 (2013.01) [C23C 16/45544 (2013.01); C23C 16/505 (2013.01); G01J 3/443 (2013.01); G01N 21/68 (2013.01); H01J 37/3244 (2013.01); H01J 37/32972 (2013.01); G01N 21/15 (2013.01); G01N 2201/08 (2013.01); H01J 2237/24485 (2013.01); H01J 2237/24507 (2013.01)] 11 Claims
OG exemplary drawing
 
1. An apparatus configured for depositing a film on a semiconductor wafer comprising:
a first reaction chamber configured to hold a first semiconductor wafer;
a second reaction chamber configured to hold a second semiconductor wafer;
a first gas source configured to provide a first gas precursor to the first reaction chamber;
a second gas source configured to provide a second gas precursor to the second reaction chamber;
a first sampling port coupled to the first reaction chamber;
a second sampling port coupled to the second reaction chamber;
a RF source coupled to the first sampling port and the second sampling port, the RF source ionizing the first gas precursor and/or the second gas precursor;
an optical emissions spectrometer coupled to the RF source, the optical emissions spectrometer configured to obtain a light spectrum of the ionized first gas precursor and/or the ionized second gas precursor; and
an exhaust pump coupled to the RF source and configured to exhaust the ionized first gas precursor and/or the ionized second gas precursor;
wherein a concentration of the ionized first gas precursor and/or the ionized second gas precursor is determined based on the light spectrum.