US 11,939,668 B2
Gas delivery for tungsten-containing layer
Zubin Huang, Santa Clara, CA (US); Mohammed Jaheer Sherfudeen, Guduvancheri (IN); David Matthew Santi, San Mateo, CA (US); Jallepally Ravi, San Ramon, CA (US); Peiqi Wang, Campbell, CA (US); and Kai Wu, Palo Alto, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 26, 2022, as Appl. No. 17/729,943.
Prior Publication US 2023/0340662 A1, Oct. 26, 2023
Int. Cl. C23C 16/06 (2006.01); C23C 16/08 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01)
CPC C23C 16/08 (2013.01) [C23C 16/45523 (2013.01); C23C 16/458 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of forming a tungsten-containing layer over a substrate, the method comprising:
a) positioning a substrate on a substrate support in a process volume of a process chamber;
b) providing a precursor gas to the process volume of the process chamber for a first duration; and
c) providing a tungsten-containing gas to the process volume of the process chamber by opening a pulsing valve on a tungsten-containing gas delivery line for a second duration occurring after the first duration to form a tungsten-containing layer on the substrate, wherein
the tungsten-containing gas delivery line includes a first section connected to an inlet of the pulsing valve and a second section connected to an outlet of the pulsing valve,
the first section connects the inlet of the pulsing valve to a reservoir of tungsten-containing gas,
the second section connects the outlet of the pulsing valve to an inlet of the process volume of the process chamber, and
an internal cross-sectional area of the first section of the tungsten-containing gas delivery line is at least 10% larger than an internal cross-sectional area of the second section of the tungsten-containing gas delivery line.