US 11,939,416 B2
Composition for optical stereolithography, stereolithographic object, and method for producing the same
Hiroaki Okamoto, Warabi (JP); and Masaro Nakatsuka, Warabi (JP)
Assigned to Okamoto Chemical Industry Co., Ltd., Warabi (JP)
Appl. No. 16/963,018
Filed by OKAMOTO CHEMICAL INDUSTRY CO., LTD., Warabi (JP)
PCT Filed Mar. 29, 2018, PCT No. PCT/JP2018/013222
§ 371(c)(1), (2) Date Jul. 17, 2020,
PCT Pub. No. WO2019/146132, PCT Pub. Date Aug. 1, 2019.
Claims priority of application No. 2018-011658 (JP), filed on Jan. 26, 2018.
Prior Publication US 2020/0339722 A1, Oct. 29, 2020
Int. Cl. C08F 290/06 (2006.01); C08J 5/18 (2006.01)
CPC C08F 290/06 (2013.01) [C08J 5/18 (2013.01); C08J 2351/08 (2013.01)] 21 Claims
 
1. A composition for optical stereolithography, comprising:
(A) a diallyl phthalate-based polymer;
(B) radical polymerizable compounds having a methacrylic group and/or an acrylic group;
(C) a radical polymerization initiator; and
(D) a sensitizer,
wherein the (B) radical polymerizable compounds having a methacrylic group and/or an acrylic group comprises at least
(B1) a radical polymerizable compound of an epoxy (meth)acrylate having a methacrylic group and/or an acrylic group, and/or
(B2) a radical polymerizable compound of a dioxane (meth)acrylate having a methacrylic group and/or an acrylic group,
wherein the composition for optical stereolithography contains:
0.5 to 10% by mass of the (A) diallyl phthalate-based polymer;
5 to 43% by mass of a total content of the (B1) and (B2) radical polymerizable compounds,
20 to 95% by mass of a radical polymerizable compound in the (B) radical polymerizable compounds other than the (B1) and (B2) radical polymerizable compounds,
0.1 to 5% by mass of the (C) radical polymerization initiator, and
0.1 to 5% by mass of the (D) sensitizer.