US 11,939,215 B2
Microelectromechanical structure including a functional element situated in a cavity of the microelectromechanical structure
Penny Weir, Reutlingen (DE); Markus Kuhnke, Wannweil (DE); and Stefan Majoni, Weil Im Schoenbuch (DE)
Assigned to ROBERT BOSCH GMBH, Stuttgart (DE)
Appl. No. 17/266,482
Filed by Robert Bosch GmbH, Stuttgart (DE)
PCT Filed Oct. 4, 2019, PCT No. PCT/EP2019/076907
§ 371(c)(1), (2) Date Feb. 5, 2021,
PCT Pub. No. WO2020/078739, PCT Pub. Date Apr. 23, 2020.
Claims priority of application No. 102018217894.1 (DE), filed on Oct. 18, 2018.
Prior Publication US 2021/0229986 A1, Jul. 29, 2021
Int. Cl. B81C 1/00 (2006.01); B81B 3/00 (2006.01)
CPC B81C 1/00698 (2013.01) [B81B 3/0018 (2013.01); B81B 2201/0271 (2013.01); B81C 2203/0145 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A microelectromechanical structure, comprising:
a functional element situated in a cavity of the microelectromechanical structure, the functional element including an aluminum nitride layer;
wherein the cavity is closed by a cap layer, the cap layer including epitaxial silicon,
wherein the aluminum nitride layer includes an insulating layer at an edge of the functional element,
wherein the functional element includes a first silicon layer and a second silicon layer, the aluminum nitride layer being situated between the first silicon layer and the second silicon layer, and
wherein the insulating layer separates the upper and lower silicon layers at the edge.