US 11,938,493 B2
Apparatus for processing substrate and operating method thereof
Noh Hoon Myoung, Seoul (KR); Han Seon Kang, Gyeonggi-do (KR); and Jung Min Yoon, Daegu (KR)
Assigned to Semes Co., Ltd., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Aug. 5, 2020, as Appl. No. 16/985,535.
Claims priority of application No. 10-2019-0095884 (KR), filed on Aug. 7, 2019.
Prior Publication US 2021/0039119 A1, Feb. 11, 2021
Int. Cl. B05B 1/34 (2006.01); B05B 3/00 (2006.01); B05B 12/08 (2006.01); B05B 12/12 (2006.01); B05B 13/04 (2006.01); B05B 14/40 (2018.01); B05B 16/60 (2018.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01)
CPC B05B 1/3402 (2018.08) [B05B 3/006 (2013.01); B05B 12/08 (2013.01); B05B 12/124 (2013.01); B05B 13/0405 (2013.01); B05B 13/0442 (2013.01); B05B 14/40 (2018.02); B05B 16/60 (2018.02); H01L 21/67051 (2013.01); H01L 21/6715 (2013.01); H01L 21/67253 (2013.01); H01L 21/67259 (2013.01); H01L 21/68 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a support module that supports a substrate and is swingable;
a swing nozzle that is arranged on one side of the support module, moves in a swing manner, and sprays a chemical solution to the substrate;
a sensor arranged on one side of the swing nozzle to sense movement of the swing nozzle;
an electromagnet and a magnet installed on the other side of the swing nozzle so as to be able to adjust spacing relative to each other; and
a controller for receiving a sensing result of the sensor and performing a damping operation to the swing nozzle by providing power to the electromagnet to generate an attractive force or repulsive force between the electromagnet and the magnet.