US 11,938,090 B2
Substrate having a marking element, container comprising such a substrate and method for producing a substrate having a marking element
Oliver Sohr, Mainz (DE); Stephan Corvers, Oestrich-Winkel (DE); and Christoph Brüning, Kiedrich (DE)
Assigned to SCHOTT Pharma AG & Co. KGaA, Mainz (DE)
Filed by SCHOTT Pharma AG & Co. KGaA, Mainz (DE)
Filed on Nov. 3, 2020, as Appl. No. 17/088,155.
Claims priority of application No. 19207008 (EP), filed on Nov. 4, 2019.
Prior Publication US 2021/0128410 A1, May 6, 2021
Int. Cl. A61J 1/18 (2023.01); A61J 1/03 (2023.01); A61J 1/05 (2006.01); B23K 26/362 (2014.01); C03C 15/00 (2006.01); C03C 23/00 (2006.01)
CPC A61J 1/18 (2013.01) [A61J 1/03 (2013.01); A61J 1/05 (2013.01); C03C 15/00 (2013.01); C03C 23/0025 (2013.01); A61J 2205/50 (2013.01); B23K 26/362 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A substrate, comprising:
a first surface area, the substrate having a first roughness value for a surface roughness of the first surface area;
a second surface area, the substrate having a second roughness value for a surface roughness of the second surface area, wherein in a height profile of the substrate along a cutting line crossing at least in part the first surface area and the second surface area, a height of the substrate along a first section of the height profile corresponding to the first surface area is larger than the height of the substrate along a second section of the height profile corresponding to the second surface area, the cutting line defining a line along which the height of a cross-section of the substrate is measured to define the height profile, wherein in the height profile an absolute value of a height difference between a point of maximum height or an averaged height, respectively, of the second section and a point of minimal height or an averaged height, respectively, of the first section defines a depth value, wherein a ratio of the depth value and the second roughness value is between 2 and 35; and
a marking element extending across the first surface area and the second surface area and comprising a cavity graved into the substrate, the first surface area and the second surface area together constituting the marking element, wherein across or beneath the first surface area the substrate has a first ratio value for a ratio of concentrations of two materials present in the first surface area or in a distinct depth in the substrate beneath thereof and wherein across or beneath the second surface area the substrate has a second ratio value for a ratio of concentrations of two materials present in the second surface area or in a distinct depth in the substrate beneath thereof, wherein the two materials comprise Si and B, a concentration of B is greater in the second surface area than in the first surface area.