US 11,937,363 B2
High power ion beam generator systems and methods
Arne Kobernik, Monona, WI (US); Carl Sherven, Monona, WI (US); Casey Lamers, Monona, WI (US); Chris Seyfert, Monona, WI (US); Evan Sengbusch, Monona, WI (US); Gabriel Becerra, Monona, WI (US); Jin Lee, Monona, WI (US); Logan Campbell, Monona, WI (US); Mark Thomas, Monona, WI (US); Michael Taylor, Monona, WI (US); Preston Barrows, Monona, WI (US); Ross Radel, Monona, WI (US); and Tye Gribb, Monona, WI (US)
Assigned to SHINE Technologies, LLC, Janesville, WI (US)
Filed by SHINE Technologies, LLC, Janesville, WI (US)
Filed on Jan. 9, 2023, as Appl. No. 18/094,726.
Application 18/094,726 is a continuation of application No. 16/742,186, filed on Jan. 14, 2020, granted, now 11,582,857.
Application 16/742,186 is a continuation of application No. 16/196,766, filed on Nov. 20, 2018, granted, now 10,701,792, issued on Jun. 30, 2020.
Application 16/196,766 is a continuation of application No. 15/873,664, filed on Jan. 17, 2018, granted, now 10,206,273, issued on Feb. 12, 2019.
Claims priority of provisional application 62/447,685, filed on Jan. 18, 2017.
Prior Publication US 2023/0171872 A1, Jun. 1, 2023
Int. Cl. H05H 7/22 (2006.01); H01J 37/32 (2006.01); H01J 41/14 (2006.01); H05B 31/26 (2006.01); H05H 1/46 (2006.01); H05H 1/54 (2006.01); H05H 3/06 (2006.01); H05H 5/04 (2006.01); H05H 6/00 (2006.01); H05H 9/02 (2006.01); H01J 37/08 (2006.01); H01J 41/04 (2006.01); H01T 23/00 (2006.01)
CPC H05H 7/22 (2013.01) [H01J 37/32082 (2013.01); H01J 41/14 (2013.01); H05B 31/26 (2013.01); H05H 1/46 (2013.01); H05H 1/54 (2013.01); H05H 3/06 (2013.01); H05H 5/04 (2013.01); H05H 6/00 (2013.01); H05H 9/02 (2013.01); H01J 37/08 (2013.01); H01J 41/04 (2013.01); H01T 23/00 (2013.01); H05H 1/4622 (2021.05)] 9 Claims
OG exemplary drawing
 
1. A system comprising:
a) an accelerator sub-system that generates a high-energy ion beam, wherein the accelerator sub-system comprises:
i) an ion source plasma chamber,
ii) a microwave generating component which generates microwaves,
iii) a power source operably linked to the microwave generating component,
iv) a waveguide positioned to receive the microwaves and deliver them to the ion source plasma chamber, wherein when the microwaves contact a gas in the ion plasma chamber to generate a source of ions;
v) an ion beam extraction component that is operably linked to the ion source plasma chamber to extract a low-energy ion beam from the ion plasma chamber,
iv) an accelerator component comprising an accelerator column, an accelerator entrance opening for receiving a low-energy ion beam, and an accelerator exit opening for delivering a high-energy ion beam; and
b) a power modulating component operably linked to the power source, wherein the power modulating component is configured to modulate power flowing from the power source to the microwave generating component.