US 11,935,776 B2
Electrostatically clamped edge ring
Christopher Kimball, San Jose, CA (US); Keith Gaff, Fremont, CA (US); and Feng Wang, Sunnyvale, CA (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Feb. 12, 2021, as Appl. No. 17/175,315.
Application 15/894,670 is a division of application No. 15/343,010, filed on Nov. 3, 2016, granted, now 9,922,857, issued on Mar. 20, 2018.
Application 17/175,315 is a continuation of application No. 15/894,670, filed on Feb. 12, 2018, granted, now 10,923,380.
Prior Publication US 2021/0166965 A1, Jun. 3, 2021
Int. Cl. H01L 21/683 (2006.01); H01J 37/00 (2006.01); H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/00 (2013.01); H01J 37/32082 (2013.01); H01J 37/32568 (2013.01); H01J 37/32642 (2013.01); H01J 37/32697 (2013.01); H01J 37/32816 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01L 21/67109 (2013.01); H01L 21/67126 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/6831 (2013.01); H01L 21/68735 (2013.01); H01L 22/26 (2013.01); H01J 2237/334 (2013.01); H01L 21/68785 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A method for electrostatically clamping an edge ring in a plasma processing chamber with an electrostatic ring clamp with at least one ring backside temperature channel for providing a flow of gas to the edge ring to regulate the temperature; comprising:
providing a vacuum to the at least one ring backside temperature channel;
measuring pressure in the at least one ring backside temperature channel;
providing an electrostatic ring clamping voltage when the pressure in the at least one ring backside temperature channel reaches a threshold maximum pressure;
discontinuing the vacuum to the at least one ring backside temperature channel;
measuring pressure in the at least one ring backside temperature channel;
if pressure in the at least one ring backside temperature channel rises faster than a threshold rate, indicating sealing failure; and
if pressure in the at least one ring backside temperature channel does not rise faster than the threshold rate, providing a plasma process, using the at least one ring backside temperature channel to regulate a temperature of the edge ring.