CPC C23C 16/45544 (2013.01) [C23C 16/4405 (2013.01); C23C 16/4408 (2013.01); C23C 16/4412 (2013.01); C23C 16/452 (2013.01); C23C 16/45502 (2013.01); C23C 16/45536 (2013.01); C23C 16/45565 (2013.01); C23C 16/45591 (2013.01); H01J 37/32357 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32834 (2013.01)] | 20 Claims |
1. A lid for a substrate processing chamber, comprising:
a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate;
an upper flange extending radially outward from the lid plate; and
one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.
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