US 11,929,236 B2
Methods of tuning to improve plasma stability
Shouqian Shao, Fremont, CA (US); Jianhua Zhou, Campbell, CA (US); and Tae Kyung Won, San Jose, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Appl. No. 17/630,878
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Aug. 28, 2019, PCT No. PCT/US2019/048619
§ 371(c)(1), (2) Date Jan. 27, 2022,
PCT Pub. No. WO2021/040707, PCT Pub. Date Mar. 4, 2021.
Prior Publication US 2022/0270858 A1, Aug. 25, 2022
Int. Cl. H01J 37/32 (2006.01); C23C 16/505 (2006.01)
CPC H01J 37/32183 (2013.01) [C23C 16/505 (2013.01); H01J 2237/327 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of tuning during a plasma process providing processing gas through a showerhead, the method comprising:
receiving, by a controller, tuning parameter information from each matching network of multiple matching networks, wherein each matching network of the multiple matching networks couples a radio frequency (RF) power source to one of multiple connection points of an electrode;
determining a tuning sequence for the multiple matching networks based on the tuning parameter information received by the controller; and
tuning one of the multiple matching networks while simultaneously locking each remaining matching networks of the multiple matching networks.