US 11,929,233 B2
Method of adjusting the output power of a power supply supplying electrical power to a plasma, plasma apparatus and power supply
Jakub Swiatnicki, Zdunska Wola (PL); Krzysztof Ruda, Zielonka (PL); Mateusz Wiosna, Gluchow (PL); Grzegorz Toczylowski, Zabki (PL); and Jialei Chen, Shanghai (CN)
Assigned to TRUMPF HUETTINGER SP. Z O. O., Zielonka (PL)
Filed by TRUMPF Huettinger Sp. z o. o., Zielonka (PL)
Filed on Dec. 17, 2021, as Appl. No. 17/553,875.
Application 17/553,875 is a continuation of application No. PCT/CN2019/092523, filed on Jun. 24, 2019.
Prior Publication US 2022/0115207 A1, Apr. 14, 2022
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32082 (2013.01) [H01J 37/32568 (2013.01); H01J 37/32935 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method of adjusting an output power of a power supply supplying electrical power to a plasma in a plasma chamber, the method comprising:
connecting the power supply to at least one electrode in the plasma chamber;
transporting one or more substrates relative to the electrode using a substrate carrier;
maintaining the plasma by the electrical power;
processing the one or more substrates with the plasma; and
adjusting the output power based on a parameter related to a distance between a surface of the electrode facing a carrier-substrate-assembly and a surface of the substrate-carrier-assembly facing the electrode.