US 11,929,231 B2
Charged particle beam device
Akito Tanokuchi, Tokyo (JP); Seiichiro Kanno, Tokyo (JP); and Kei Shibayama, Ibaraki (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Filed by HITACHI HIGH-TECH CORPORATION, Tokyo (JP)
Filed on Apr. 20, 2022, as Appl. No. 17/725,151.
Application 17/725,151 is a continuation of application No. 16/474,846, granted, now 11,335,533, previously published as PCT/JP2017/007084, filed on Feb. 24, 2017.
Prior Publication US 2022/0246387 A1, Aug. 4, 2022
Int. Cl. H01J 37/20 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/20 (2013.01) [H01J 37/28 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/202 (2013.01)] 4 Claims
OG exemplary drawing
 
1. A charged particle beam device including an electrostatic chuck mechanism, the charged particle beam device comprising:
a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam;
an insulating body which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck mechanism; and
a ring-shaped electrode which encloses the surroundings of the sample and to which a predetermined voltage is applied;
wherein the ring-shaped electrode is made of a nonmagnetic conductor made of a mixture of aluminum and metal silicon.