US 11,927,881 B2
Pellicle for extreme ultraviolet lithography based on yttrium carbide
Hyeong Keun Kim, Yongin-si (KR); Seul Gi Kim, Yongin-si (KR); Hyun Mi Kim, Seoul (KR); Jin Woo Cho, Seoul (KR); and Ki Hun Seong, Anyang-si (KR)
Assigned to Korea Electronics Technology Institute, Seongnam-si (KR)
Filed by KOREA ELECTRONICS TECHNOLOGY INSTITUTE, Seongnam-si (KR)
Filed on Nov. 29, 2021, as Appl. No. 17/456,839.
Claims priority of application No. 10-2021-0142410 (KR), filed on Oct. 25, 2021.
Prior Publication US 2023/0125229 A1, Apr. 27, 2023
Int. Cl. G03F 1/64 (2012.01); G03F 1/62 (2012.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01)
CPC G03F 1/62 (2013.01) [G03F 7/11 (2013.01); G03F 7/2004 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A pellicle for extreme ultraviolet lithography, comprising:
a pellicle layer including a core layer containing yttrium carbide, and a capping layer formed over one or both surfaces of the core layer; and
a substrate configured to support the pellicle layer,
wherein the yttrium carbide is YCx in which an atomic percentage of carbon is within a range of 25% to 45%.