CPC C23C 16/45544 (2013.01) [C23C 16/45561 (2013.01); C23C 16/45563 (2013.01); C23C 16/45582 (2013.01)] | 12 Claims |
1. An atomic layer deposition apparatus having a reaction chamber disposed inside a vacuum chamber and a fixed gas manifold assembly fixedly provided to the atomic layer deposition apparatus and configured to supply gases from outside the vacuum chamber to the reaction chamber, wherein the reaction chamber is a movable reaction chamber which is configured to be movable relative to the vacuum chamber and relative to the fixed gas manifold assembly, the atomic layer deposition apparatus further comprises:
a connection arrangement coupling the movable reaction chamber to the fixed gas manifold assembly, the connection arrangement comprises:
a flexible outer flange assembly surrounding the fixed gas manifold assembly, and
a first connection surface connecting to a second connection surface of the reaction chamber.
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