	US 11,926,581 B2
	Sulfonium salt, photoacid generator, curable composition, and resist composition
Takuto Nakao, Kyoto (JP); and Yusaku Takashima, Kyoto (JP)
Assigned to SAN-APRO LIMITED, Kyoto (JP)
Appl. No. 17/047,446
Filed by SAN-APRO LTD., Kyoto (JP)
PCT Filed Apr. 9, 2019, PCT No. PCT/JP2019/015390 § 371(c)(1), (2) Date Oct. 14, 2020, PCT Pub. No. WO2019/225185, PCT Pub. Date Nov. 28, 2019.
Claims priority of application No. 2018-100323 (JP), filed on May 25, 2018.
Prior Publication US 2021/0147352 A1, May 20, 2021
Int. Cl. C07C 381/12 (2006.01); G03F 7/038 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01)

CPC C07C 381/12 (2013.01) [G03F 7/0382 (2013.01); G03F 7/094 (2013.01); G03F 7/2002 (2013.01); G03F 7/2039 (2013.01)]

17 Claims

1. A sulfonium salt represented by formula (1) described below.