US 11,915,905 B2
Support unit and substrate treating apparatus including the same
Hyoungkyu Son, Seoul (KR); Yu Dong Han, Daejeon (KR); Hyeon Gyu Kim, Cheonan-si (KR); and Seon Ok Kim, Asan-si (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-Do (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Jul. 1, 2020, as Appl. No. 16/918,299.
Claims priority of application No. 10-2019-0079203 (KR), filed on Jul. 2, 2019.
Prior Publication US 2021/0005419 A1, Jan. 7, 2021
Int. Cl. H01J 37/32 (2006.01); H01L 21/683 (2006.01); H01J 37/20 (2006.01)
CPC H01J 37/20 (2013.01) [H01J 37/32082 (2013.01); H01J 37/32532 (2013.01); H01J 37/32715 (2013.01); H01L 21/683 (2013.01); H01J 2237/334 (2013.01)] 15 Claims
OG exemplary drawing
 
10. An apparatus for treating a substrate, the apparatus comprising:
a chamber having a treatment space therein;
a support unit configured to support the substrate in the treatment space;
a gas supply unit configured to supply a gas into the treatment space; and
a plasma source configured to generate plasma from the gas,
wherein the support unit includes,
a dielectric plate configured to receive the substrate thereon,
an electrode plate disposed under the dielectric plate,
a radio frequency (RF) power supply rod configured to apply power to the electrode plate, the power supply rod extending in a vertical direction,
a flange having a shape surrounding the power supply rod, the flange being spaced apart from the power supply rod, and
a lifting member configured to move the flange in an up-down direction,
wherein the flange includes a first body and a second body, the first body extending in the vertical direction and including an upper end facing the electrode plate and a lower end, and the second body extending outwardly from the lower end of the first body in a lateral direction and coupled to the lifting member,
wherein the flange is grounded and surrounds part of the power supply rod, and
wherein the lifting member includes an elastic body, and a shock-absorbing pin, the elastic body provided on a lower surface of the flange, the shock-absorbing pin being under and coupled to the elastic body, and the lifting member is configured to move the flange in the up-down direction to adjust a distance between the flange and the electrode plate.