US 11,914,305 B2
Data inspection for digital lithography for HVM using offline and inline approach
Chung-Shin Kang, San Jose, CA (US); Jun Yang, San Jose, CA (US); and Hongbin Ji, Santa Clara, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Appl. No. 17/792,667
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Feb. 18, 2020, PCT No. PCT/US2020/018546
§ 371(c)(1), (2) Date Jul. 13, 2022,
PCT Pub. No. WO2021/167587, PCT Pub. Date Aug. 26, 2021.
Prior Publication US 2023/0042334 A1, Feb. 9, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70508 (2013.01) [G03F 7/704 (2013.01); G03F 7/70291 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for data inspection in a lithographic system, the method comprising:
obtaining a data prep bitmap from a data prep server;
optimizing the data prep bitmap at an imaging unit server to create an imaging unit server bitmap;
comparing the data prep bitmap to the imaging unit server bitmap;
processing the imaging unit server bitmap with a rasterizer to create an imaging unit bitmap;
creating a first checksum from the imaging unit server bitmap and a second checksum from the imaging unit bitmap; and
comparing the first checksum and second checksum with a processor.