	US 11,912,617 B2
	Silica glass for radio-frequency device and radio-frequency device technical field
Nobutaka Kidera, Tokyo (JP); Kazuya Sasaki, Fukushima (JP); and Yasutomi Iwahashi, Fukushima (JP)
Assigned to AGC Inc., Chiyoda-ku (JP)
Filed by AGC Inc., Chiyoda-ku (JP)
Filed on Apr. 28, 2020, as Appl. No. 16/860,107.
Application 16/860,107 is a continuation of application No. PCT/JP2018/040155, filed on Oct. 29, 2018.
Claims priority of application No. 2017-215119 (JP), filed on Nov. 7, 2017; and application No. 2018-004232 (JP), filed on Jan. 15, 2018.
Prior Publication US 2020/0255324 A1, Aug. 13, 2020
Int. Cl. C03C 3/06 (2006.01); C03C 4/16 (2006.01); H01P 1/208 (2006.01); H01P 3/12 (2006.01); H04B 1/40 (2015.01)

CPC C03C 3/06 (2013.01) [C03C 4/16 (2013.01); H01P 1/2088 (2013.01); H01P 3/121 (2013.01); C03C 2201/23 (2013.01); C03C 2204/00 (2013.01); H04B 1/40 (2013.01)]

10 Claims

1. A silica glass for a radio-frequency device, the silica glass having an OH group concentration being less than or equal to 300 wtppm; and an FQ value being higher than or equal to 90,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz and higher than or equal to 200,000 GHz at a frequency of higher than or equal to 70 GHz and lower than or equal to 100 GHz.