CPC B24B 37/24 (2013.01) [B24B 37/26 (2013.01); B24B 37/22 (2013.01)] | 20 Claims |
1. A polishing pad, comprising:
a plurality of polishing elements, each comprising:
an individual surface that forms a portion of a polishing surface of the polishing pad; and
one or more sidewalls extending downwardly from the individual surface to define a plurality of channels disposed between the polishing elements, wherein:
each of the polishing elements has a plurality of pore-features formed therein,
each of the polishing elements is formed of a pre-polymer composition, the pre-polymer composition, comprising:
from about 40 wt % to about 50 wt % of a difunctional aliphatic urethane methacrylate, the difunctional aliphatic urethane methacrylate having a chain length within a range of about 2 to about 16 mer units and methacrylate end groups; and
from about 5 wt % to about 10 wt % of a difunctional aliphatic urethane acrylate oligomer having a chain length within a range of about 30 to about 200 mer units and acrylate end groups;
the pre-polymer composition has a glass transition temperature (Tg) of about 80° C. or greater, and
a storage modulus (E′) of the pre-polymer composition at a temperature of 80° C. (E′80) is about 200 MPa or greater.
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