US 11,895,842 B2
Nonvolatile memory device having cell on periphery structure
Changyeon Yu, Hwaseong-si (KR); and Pansuk Kwak, Goyang-si (KR)
Assigned to SAMSUNG ELECTRONICS CO, LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Jun. 11, 2021, as Appl. No. 17/345,832.
Claims priority of application No. 10-2020-0132567 (KR), filed on Oct. 14, 2020.
Prior Publication US 2022/0115393 A1, Apr. 14, 2022
Int. Cl. G11C 16/04 (2006.01); H10B 43/40 (2023.01); H01L 21/66 (2006.01); H01L 23/535 (2006.01); H10B 41/27 (2023.01); H10B 41/41 (2023.01); H10B 43/27 (2023.01); G11C 16/24 (2006.01)
CPC H10B 43/40 (2023.02) [H01L 22/34 (2013.01); H01L 23/535 (2013.01); H10B 41/27 (2023.02); H10B 41/41 (2023.02); H10B 43/27 (2023.02); G11C 16/0483 (2013.01); G11C 16/24 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A nonvolatile memory device having a cell over periphery (COP) structure in which peripheral circuits are disposed in a peripheral region and a memory cell array is disposed in a cell region over the peripheral region, comprising:
a first sub memory plane;
a second sub memory plane disposed adjacent to the first sub memory plane in a row direction;
a first vertical contact region disposed in the cell region of the first sub memory plane, wherein the first vertical contact region is disposed closer to a first end portion of the cell region in a column direction than to a second end portion of the cell region;
a second vertical contact region disposed in the cell region of the second sub memory plane, wherein the second vertical contact region is disposed closer to the second end portion than to the first end portion of the cell region, wherein the second end portion is opposite to the first end portion in a column direction;
a first overhead region disposed in the cell region of the first sub memory plane, wherein the first overhead region is adjacent to the second vertical contact region in the row direction;
a second overhead region disposed M the cell region of the second sub memory plane, wherein the second overhead region is adjacent to the first vertical contact region in the row direction;
vertical contacts disposed in the first vertical contact region and the second contact region and extending in a vertical direction; and
cell channel structures disposed in a main region of the cell region, each cell channel structure including a string selection transistor, memory cells and a ground selection transistor.