US 11,894,257 B2
Single wafer processing environments with spatial separation
Michael Rice, Pleasanton, CA (US); Joseph AuBuchon, San Jose, CA (US); Sanjeev Baluja, Campbell, CA (US); and Mandyam Sriram, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 26, 2018, as Appl. No. 16/171,785.
Claims priority of provisional application 62/578,365, filed on Oct. 27, 2017.
Prior Publication US 2019/0131167 A1, May 2, 2019
Int. Cl. H01L 21/68 (2006.01); H01L 21/687 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); H01L 21/67 (2006.01); C23C 16/46 (2006.01); H01L 21/683 (2006.01); C23C 16/455 (2006.01)
CPC H01L 21/68785 (2013.01) [C23C 16/4409 (2013.01); C23C 16/4584 (2013.01); C23C 16/45525 (2013.01); C23C 16/46 (2013.01); H01L 21/6719 (2013.01); H01L 21/67103 (2013.01); H01L 21/67248 (2013.01); H01L 21/6831 (2013.01); H01L 21/6833 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A support assembly comprising:
a rotatable center base defining a rotational axis;
at least two support arms extending from the rotatable center base, each of the support arms having an inner end in contact with the center base and an outer end further from the rotational axis than the inner end;
a plurality of heaters, each heater positioned on the outer end of each of the support arms, each of the plurality of heaters having a support surface with a center located a distance from the rotational axis so that upon rotation of the center base the heaters move in a circular path; and
a channel formed in the rotatable center base and the support arms, the channel configured to route electrical connections to the plurality of heaters;
wherein the support surfaces of the heaters are substantially coplanar.