CPC H01L 21/223 (2013.01) | 20 Claims |
1. A method of adjusting a work function of a structure on a substrate, comprising:
coating surfaces of the structure to form a doping layer in a non-solid phase that contains dopants on the surfaces of the structure, wherein the structure has an aspect ratio of at least 50:1; and
performing a dopant diffusion process using an oxidation process to drive the dopants through the surfaces the structure to embed the dopants in the structure to adjust the work function of the structure near the surfaces to form an abrupt junction profile and form an oxidation layer on the surfaces of the structure.
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