US 11,894,232 B2
Methods for forming charge layers using gas and liquid phase coatings
Taichou Papo Chen, San Jose, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 22, 2022, as Appl. No. 17/701,242.
Prior Publication US 2023/0307235 A1, Sep. 28, 2023
Int. Cl. H01L 21/223 (2006.01)
CPC H01L 21/223 (2013.01) 20 Claims
OG exemplary drawing
 
1. A method of adjusting a work function of a structure on a substrate, comprising:
coating surfaces of the structure to form a doping layer in a non-solid phase that contains dopants on the surfaces of the structure, wherein the structure has an aspect ratio of at least 50:1; and
performing a dopant diffusion process using an oxidation process to drive the dopants through the surfaces the structure to embed the dopants in the structure to adjust the work function of the structure near the surfaces to form an abrupt junction profile and form an oxidation layer on the surfaces of the structure.