US 11,892,775 B2
Storage container storing treatment liquid for manufacturing semiconductor
Tetsuya Shimizu, Shizuoka (JP); and Tetsuya Kamimura, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Feb. 21, 2022, as Appl. No. 17/676,235.
Application 17/676,235 is a continuation of application No. 16/143,497, filed on Sep. 27, 2018, granted, now 11,693,321.
Application 16/143,497 is a continuation of application No. PCT/JP2017/010618, filed on Mar. 16, 2017.
Claims priority of application No. 2016-073257 (JP), filed on Mar. 31, 2016; and application No. 2017-045864 (JP), filed on Mar. 10, 2017.
Prior Publication US 2022/0179320 A1, Jun. 9, 2022
Int. Cl. G03F 7/32 (2006.01); G03F 7/30 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); B65D 25/14 (2006.01); B65D 85/00 (2006.01); H01L 21/308 (2006.01)
CPC G03F 7/32 (2013.01) [B65D 25/14 (2013.01); B65D 85/00 (2013.01); B65D 85/70 (2013.01); G03F 7/16 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01); H01L 21/0271 (2013.01); H01L 21/0274 (2013.01); H01L 21/308 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A storage container comprising:
a treatment liquid for manufacturing a semiconductor; and
a storage portion that stores the treatment liquid,
wherein the treatment liquid includes one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, and
a total content of particulate metal that is a metal component derived from the metal atoms and that is a nonionic metal component present in the treatment liquid as a solid without being dissolved is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing the semiconductor,
wherein a mass of the particulate metal is measured by a SP-ICP-MS method.