US 11,892,770 B2
Imprint system, replica mold manufacturing apparatus, and article manufacturing method
Yosuke Murakami, Utsunomiya (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Feb. 19, 2020, as Appl. No. 16/794,537.
Claims priority of application No. 2019-043043 (JP), filed on Mar. 8, 2019.
Prior Publication US 2020/0285146 A1, Sep. 10, 2020
Int. Cl. G03F 7/00 (2006.01); B29C 33/38 (2006.01)
CPC G03F 7/0002 (2013.01) [B29C 33/3842 (2013.01)] 9 Claims
OG exemplary drawing
 
1. An imprint system comprising:
a replica mold manufacturing apparatus configured to manufacture a replica mold which is a replica of a master mold by performing a first imprint process of bringing the master mold into contact with an imprint material on a blank mold to form a pattern of the imprint material wherein the replica mold manufacturing apparatus is configured to manufacture the replica mold by performing the first imprint process once on a surface of the blank mold;
an imprint apparatus configured to perform a second imprint process of bringing the replica mold manufactured by the replica mold manufacturing apparatus into contact with an imprint material on a shot region of a substrate to form a pattern of the imprint material, wherein a plurality of shot regions are provided on the substrate and the imprint apparatus is configured to perform the second imprint process on each of the plurality of shot regions on the substrate; and
a controller, including a memory and a processor, configured to set a first imprint condition that is an imprint condition of the first imprint process to be used in the replica mold manufacturing apparatus and a second imprint condition that is an imprint condition of the second imprint process to be used in the imprint apparatus,
wherein the controller is configured to:
form the pattern on the shot region by performing the second imprint process using the second imprint condition set such that an extrusion of the imprint material does not occur from the shot region and an overlay state falls within an allowable range, with the imprint apparatus using the replica mold manufactured by performing the first imprint process with the replica mold manufacturing apparatus,
obtain the overlay state between the shot region and the pattern formed on the shot region by performing the second imprint process using the second imprint condition, and
correct the first imprint condition of the replica mold manufacturing apparatus, to be used in a manufacture of a next replica mold so that the next replica mold is manufactured in which a difference between a value obtained from the obtained overlay state and a target value of the overlay is reflected and the overlay state falls within an allowable range.