US 11,892,428 B2
Laser ablation device and analysis apparatus
Takao Nakagawa, Tokyo (JP); and Norio Yasuda, Tokyo (JP)
Assigned to S.T.JAPAN INC., Tokyo (JP)
Appl. No. 17/047,682
Filed by S.T.JAPAN INC., Tokyo (JP)
PCT Filed Apr. 18, 2018, PCT No. PCT/JP2018/016026
§ 371(c)(1), (2) Date Oct. 14, 2020,
PCT Pub. No. WO2019/202689, PCT Pub. Date Oct. 24, 2019.
Prior Publication US 2021/0162549 A1, Jun. 3, 2021
Int. Cl. G01N 27/623 (2021.01); B23K 26/0622 (2014.01); B23K 26/40 (2014.01); G01N 21/63 (2006.01); G01N 1/04 (2006.01); G01N 1/38 (2006.01); G01N 1/28 (2006.01); B23K 103/00 (2006.01); G01N 21/73 (2006.01)
CPC G01N 27/623 (2021.01) [B23K 26/0624 (2015.10); B23K 26/40 (2013.01); G01N 1/04 (2013.01); G01N 1/286 (2013.01); G01N 1/38 (2013.01); G01N 21/63 (2013.01); B23K 2103/54 (2018.08); G01N 21/73 (2013.01); G01N 2001/045 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A laser ablation device, comprising:
a laser light source configured to output a femtosecond pulse laser beam for ablating a sample housed in a cell, wherein the femtosecond pulse laser beam has a pulse width of a femtosecond order;
an optical system configured to reflect the femtosecond pulse laser beam from the laser light source toward the sample, wherein the optical system comprises:
a first mirror rotatable about a first axis,
a second mirror rotatable about a second axis which is different from the first axis,
a first galvano motor configured to rotate the first mirror about the first axis, and
a second galvano motor configured to rotate the second mirror about the second axis, wherein the femtosecond pulse laser beam from the laser light source is reflected by the first mirror, and the femtosecond pulse laser beam reflected by the first mirror is reflected by the second mirror toward an analysis position of the sample; and
a computer configured to control the first galvano motor and the second galvano motor based on a coordinate position on two dimensions of the analysis position of the sample to change reflection angles of the first mirror and the second mirror, such that the analysis position is irradiated with the femtosecond pulse laser beam, wherein,
the computer is configured to,
when mixing and analyzing ablated samples at a plurality of analysis positions for a mixing analysis mode, set an interval between the femtosecond pulse laser beams irradiated to the sample to a predetermined low frequency, and
when analyzing the ablated samples at each of the plurality of analysis positions individually for an imaging analysis mode, set the interval between the femtosecond pulse laser beams irradiated to the sample to a predetermined high frequency.